Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
As communication-centric computing paradigm gathers momentum due to increased wire delays and excess power dissipation with technology scaling, researchers have focused their atte...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
— We discuss the effect of physical impairments on manycasting service over optical burst-switched (OBS) networks. Signal quality degradation in manycast networks is an important...
Balagangadhar G. Bathula, Rajesh R. C. Bikram, Vin...
Abstract— Optical Burst and Packet Switching are being considered as the most promising paradigms to increase bandwidth efficiency in IP over DWDM networks. In both cases, due t...