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ICIP
2010
IEEE
14 years 7 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
ANCS
2009
ACM
14 years 7 months ago
Design of a scalable nanophotonic interconnect for future multicores
As communication-centric computing paradigm gathers momentum due to increased wire delays and excess power dissipation with technology scaling, researchers have focused their atte...
Avinash Karanth Kodi, Randy Morris
ICCAD
2007
IEEE
143views Hardware» more  ICCAD 2007»
15 years 6 months ago
TIP-OPC: a new topological invariant paradigm for pixel based optical proximity correction
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
Peng Yu, David Z. Pan
ICCCN
2008
IEEE
15 years 4 months ago
Impairment-Aware Manycast Algorithms over Optical Burst-Switched Networks
— We discuss the effect of physical impairments on manycasting service over optical burst-switched (OBS) networks. Signal quality degradation in manycast networks is an important...
Balagangadhar G. Bathula, Rajesh R. C. Bikram, Vin...
ICC
2007
IEEE
15 years 4 months ago
A Cost-Effective Approach to Optical Packet/burst Scheduling
Abstract— Optical Burst and Packet Switching are being considered as the most promising paradigms to increase bandwidth efficiency in IP over DWDM networks. In both cases, due t...
Franco Callegati, Aldo Campi, Walter Cerroni