Device optimization considering supply voltage Vdd and threshold voltage Vt tuning does not increase chip area but has a great impact on power and performance in the nanometer tec...
Lerong Cheng, Phoebe Wong, Fei Li, Yan Lin, Lei He
— Starting at the 65nm node, stress engineering to improve performance of transistors has been a major industry focus. An intrinsic stress source – shallow trench isolation –...
Andrew B. Kahng, Puneet Sharma, Rasit Onur Topalog...
—A significant fraction of network events (such as topology or route changes) and the resulting performance degradation stem from premeditated network management and operational...
As VLSI technology enters the nanoscale regime, interconnect delay has become the bottleneck of the circuit timing. As one of the most powerful techniques for interconnect optimiz...
—In this paper, we present a new block budgeting algorithm which speeds up timing closure in timing driven hierarchical flows. After a brief description of the addressed flow, ...