1709 search results - page 85 / 342 » Precise Modeling of Design Patterns |
106
Voted
ICCAD
2009
IEEE
14 years 10 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
92
Voted
DATE
2008
IEEE
15 years 7 months ago
2008
IEEE
The synchronous modeling paradigm provides strong execution correctness guarantees to embedded system design while making minimal environmental assumptions. In most related framew...
111
Voted
KDD
2005
ACM
16 years 1 months ago
2005
ACM
One fundamental task in near-neighbor search as well as other similarity matching efforts is to find a distance function that can efficiently quantify the similarity between two o...
113
click to vote
WWW
2004
ACM
16 years 1 months ago
2004
ACM
Complex Semantic Web (SW) services may have intricate data state, autonomous process behavior and concurrent interactions. The design of such SW service systems requires precise a...
127
Voted
KDD
2002
ACM
16 years 1 months ago
2002
ACM
Technology in the field of digital media generates huge amounts of non-textual information, audio, video, and images, along with more familiar textual information. The potential f...