8808 search results - page 208 / 1762 » Process Change Patterns |
159
Voted
ASPDAC
2009
ACM
16 years 29 days ago
2009
ACM
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
162
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DASFAA
2008
IEEE
16 years 28 days ago
2008
IEEE
Abstract. Advances in sensing and satellite technologies and the growth of Internet have resulted in the easy accessibility of vast amount of spatial data. Extracting useful knowle...
208
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FGR
2008
IEEE
16 years 28 days ago
2008
IEEE
This paper presents a novel face representation and recognition approach. The face image is first decomposed by multi-scale and multi-orientation Gabor filters and local binary ...
177
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ICRA
2008
IEEE
16 years 27 days ago
2008
IEEE
— Central Pattern Generators (CPGs) are becoming a popular model for the control of locomotion of legged robots. Biological CPGs are neural networks responsible for the generatio...
196
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CNSR
2007
IEEE
16 years 24 days ago
2007
IEEE
Position localization of transmitters can be carried out by an adversary owning a network of pervasive receivers, which can pinpoint the victim mobile nodes’ locations with high...