30267 search results - page 5580 / 6054 » Process Modelling Languages |
180
click to vote
ISPASS
2010
IEEE
16 years 1 months ago
2010
IEEE
—Software instrumentation is a powerful and flexible technique for analyzing the dynamic behavior of programs. By inserting extra code in an application, it is possible to study...
153
click to vote
ISQED
2010
IEEE
16 years 1 months ago
2010
IEEE
With the CMOS transistors being scaled to sub 45nm and lower, Negative Bias Temperature Instability (NBTI) has become a major concern due to its impact on PMOS transistor aging pr...
194
click to vote
CHI
2010
ACM
16 years 1 months ago
2010
ACM
Privacy practices in social network sites often appear paradoxical, as content-sharing behavior stands in conflict with the need to reduce disclosure-related harms. In this study ...
178
click to vote
ISPD
2010
ACM
16 years 1 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
172
click to vote
SAC
2010
ACM
16 years 1 months ago
2010
ACM
Hosts infected with malicious software, so called malware, are ubiquitous in today’s computer networks. The means whereby malware can infiltrate a network are manifold and rang...