Abstract-- The operational characteristics of integrated circuits based on nanoscale semiconductor technology are expected to be increasingly affected by variations in the manufact...
Process variations due to lens aberrations are to a large extent systematic, and can be modeled for purposes of analyses and optimizations in the design phase. Traditionally, vari...
Andrew B. Kahng, Chul-Hong Park, Puneet Sharma, Qi...
Variability of circuit performance is becoming a very important issue for ultra-deep sub-micron technology. Gate length variation has the most direct impact on circuit performance...
Abstract--Technology scaling in the nanometer era has increased the transistor's susceptibility to process variations. The effects of such variations are having a huge impact ...
Venkataraman Mahalingam, N. Ranganathan, J. E. Har...
The synthesis of clock network in the presence of process variation is becoming a vital design issue towards the performance of digital circuits. In this paper, we propose a clock ...