33 search results - page 5 / 7 » Process variation aware OPC with variational lithography mod... |
62
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ECCV
2006
Springer
15 years 11 months ago
2006
Springer
Abstract. Active Appearance Models (AAM) are compact representations of the shape and appearance of objects. Fitting AAMs to images is a difficult, non-linear optimization task. Tr...
ISQED
2009
IEEE
15 years 4 months ago
2009
IEEE
—As device feature size continues to shrink, reliability becomes a severe issue due to process variation, particle-induced transient errors, and transistor wear-out/stress such a...
DATE
2009
IEEE
15 years 4 months ago
2009
IEEE
Abstract—This work proposes reliability aware through silicon via (TSV) planning for the 3D stacked silicon integrated circuits (ICs). The 3D power distribution network is modele...
123
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ICASSP
2011
IEEE
14 years 1 months ago
2011
IEEE
A nonparametric version of the basis pursuit method is developed for field estimation. The underlying model entails known bases, weighted by generic functions to be estimated fro...
102
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SIGMETRICS
2004
ACM
15 years 3 months ago
2004
ACM
The use of environmental energy is now emerging as a feasible energy source for embedded and wireless computing systems such as sensor networks where manual recharging or replacem...