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127
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ASPDAC
2010
ACM
637views Hardware» more  ASPDAC 2010»
14 years 10 months ago
A new graph-theoretic, multi-objective layout decomposition framework for double patterning lithography
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
220
Voted

Book
246views
16 years 10 months ago
Using, Understanding, and Unraveling The OCaml Language
"These course notes are addressed to a wide audience of people interested in modern programming languages in general, ML-like languages in particular, or simply in OCaml, whet...
Didier Remy
128
Voted
ISPD
2007
ACM
151views Hardware» more  ISPD 2007»
15 years 2 months ago
Pattern sensitive placement for manufacturability
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
Shiyan Hu, Jiang Hu
91
Voted
JOT
2007
119views more  JOT 2007»
15 years 17 days ago
Observer-Conditioned-Observable Design Pattern
The Observer-Conditioned-Observable (OCO) combines digitizing and transcoding of numeric change events. During the processing of numeric events, the transcoder converts the number...
Douglas A. Lyon, Carl F. R. Weiman
108
Voted
KDD
2009
ACM
232views Data Mining» more  KDD 2009»
16 years 1 months ago
Classification of software behaviors for failure detection: a discriminative pattern mining approach
Software is a ubiquitous component of our daily life. We often depend on the correct working of software systems. Due to the difficulty and complexity of software systems, bugs an...
David Lo, Hong Cheng, Jiawei Han, Siau-Cheng Khoo,...