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ISQED
2010
IEEE
141views Hardware» more  ISQED 2010»
15 years 6 months ago
Assessing chip-level impact of double patterning lithography
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
ACCV
1998
Springer
15 years 4 months ago
Appearance Based Visual Learning and Object Recognition with Illumination Invariance
This paper describes a method for recognizing partially occluded objects under different levels of illumination brightness by using the eigenspace analysis. In our previous work, w...
Kohtaro Ohba, Yoichi Sato, Katsushi Ikeuchi
SIGIR
2010
ACM
15 years 3 months ago
Adaptive near-duplicate detection via similarity learning
In this paper, we present a novel near-duplicate document detection method that can easily be tuned for a particular domain. Our method represents each document as a real-valued s...
Hannaneh Hajishirzi, Wen-tau Yih, Aleksander Kolcz
TIP
2011
84views more  TIP 2011»
14 years 6 months ago
Optimal Inversion of the Anscombe Transformation in Low-Count Poisson Image Denoising
—The removal of Poisson noise is often performed through the following three-step procedure. First, the noise variance is stabilized by applying the Anscombe root transformation ...
Markku Makitalo, Alessandro Foi
ICCAD
2006
IEEE
165views Hardware» more  ICCAD 2006»
15 years 8 months ago
A fast block structure preserving model order reduction for inverse inductance circuits
Most existing RCL−1 circuit reductions stamp inverse inductance L−1 elements by a second-order nodal analysis (NA). The NA formulation uses nodal voltage variables and describ...
Hao Yu, Yiyu Shi, Lei He, David Smart