—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
This paper describes a method for recognizing partially occluded objects under different levels of illumination brightness by using the eigenspace analysis. In our previous work, w...
In this paper, we present a novel near-duplicate document detection method that can easily be tuned for a particular domain. Our method represents each document as a real-valued s...
Hannaneh Hajishirzi, Wen-tau Yih, Aleksander Kolcz
—The removal of Poisson noise is often performed through the following three-step procedure. First, the noise variance is stabilized by applying the Anscombe root transformation ...
Most existing RCL−1 circuit reductions stamp inverse inductance L−1 elements by a second-order nodal analysis (NA). The NA formulation uses nodal voltage variables and describ...