15 search results - page 1 / 3 » Response Surface Modeling of 100nm CMOS Process Technology u... |
75
Voted
VLSID
2004
IEEE
16 years 37 sec ago
2004
IEEE
106
Voted
ISQED
2005
IEEE
15 years 5 months ago
2005
IEEE
As technology continues to scale beyond 100nm, there is a significant increase in performance uncertainty of CMOS logic due to process and environmental variations. Traditional c...
98
Voted
ASPDAC
2007
ACM
15 years 3 months ago
2007
ACM
With semiconductor fabrication technologies scaled below 100 nm, the design-manufacturing interface becomes more and more complicated. The resultant process variability causes a nu...
102
Voted
ISQED
2008
IEEE
15 years 6 months ago
2008
IEEE
Large-scale process fluctuations (particularly random device mismatches) at nanoscale technologies bring about highdimensional strongly nonlinear performance variations that canno...
WSC
2001
15 years 1 months ago
2001
Semiconductor manufacturing is generally considered a cyclic industry. As such, individual producers able to react quickly and appropriately to market conditions will have a compe...