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TCAD
2010
88views more  TCAD 2010»
14 years 10 months ago
Stress Aware Layout Optimization Leveraging Active Area Dependent Mobility Enhancement
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
Ashutosh Chakraborty, Sean X. Shi, David Z. Pan
184
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TCAD
2010
194views more  TCAD 2010»
14 years 10 months ago
Layout Decomposition Approaches for Double Patterning Lithography
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
148
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TON
2010
210views more  TON 2010»
14 years 10 months ago
A New Approach to Optical Networks Security: Attack-Aware Routing and Wavelength Assignment
Abstract-- Security issues and attack management in transparent WDM (Wavelength Division Multiplexing) optical networks has become of prime importance to network operators due to t...
Nina Skorin-Kapov, J. Chen, Lena Wosinska
159
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TSP
2010
14 years 10 months ago
Sequential and cooperative sensing for multi-channel cognitive radios
Effective spectrum sensing is a critical prerequisite for multi-channel cognitive radio (CR) networks, where multiple spectrum bands are sensed to identify transmission opportuniti...
Seung-Jun Kim, Georgios B. Giannakis
164
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LR
2011
156views more  LR 2011»
14 years 10 months ago
The assessment of competitive intensity in logistics markets
Scopus is the world’s largest abstract and citation database of peer-reviewed literature and quality web sources (-> http://www.info.sciverse.com/scopus). ontains 41 million r...
Peter Klaus
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