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TCAD
2010
14 years 5 months ago
2010
Abstract--This paper presents a technology mapping algorithm for field-programmable gate array architectures with dual supply voltages (Vdds) for power optimization. This is done w...
TCAD
2010
14 years 5 months ago
2010
Artificial neural networks (ANNs) have shown great promise in modeling circuit parameters for computer aided design applications. Leakage currents, which depend on process paramete...
TCAD
2010
14 years 5 months ago
2010
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
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TCAD
2010
14 years 5 months ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
108
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TNN
2010
14 years 5 months ago
2010
Abstract--In this paper, the problem of stochastic synchronization analysis is investigated for a new array of coupled discretetime stochastic complex networks with randomly occurr...