17 search results - page 4 / 4 » Statistical design and optimization of SRAM cell for yield e... |
ICCAD
1997
IEEE
13 years 9 months ago
1997
IEEE
The relentless push for high performance in custom digital circuits has led to renewed emphasis on circuit optimization or tuning. The parameters of the optimization are typically...
ICCAD
2009
IEEE
13 years 4 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...