Variations in the semiconductor fabrication process results in variability in parameters between transistors on the same die, a problem exacerbated by lithographic scaling. The re...
— As technology scales into the sub-90nm domain, manufacturing variations become an increasingly significant portion of circuit delay. As a result, delays must be modeled as sta...
Matthew R. Guthaus, Natesan Venkateswaran, Chandu ...
Statistical timing analysis has been widely applied to predict the timing yield of VLSI circuits when process variations become significant. Existing statistical latch timing met...
Traditional corner analysis fails to guarantee a target yield for a given performance metric. However, recently proposed solutions, in the form of statistical timing analysis, whi...
In nanometer regime, the effects of variations are having an increasing impact on the delay and power characteristics of devices as well as the yield of the circuit. Statistical t...