2119 search results - page 323 / 424 » Structure-Preserving Model Reduction |
ICCAD
2009
IEEE
14 years 7 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
KDD
2007
ACM
15 years 10 months ago
2007
ACM
We present a class of richly structured, undirected hidden variable models suitable for simultaneously modeling text along with other attributes encoded in different modalities. O...
KDD
2002
ACM
15 years 10 months ago
2002
ACM
Viral marketing takes advantage of networks of influence among customers to inexpensively achieve large changes in behavior. Our research seeks to put it on a firmer footing by mi...
VISUALIZATION
1999
IEEE
15 years 2 months ago
1999
IEEE
We present a method for compressing non-manifold polygonal meshes, i.e., polygonal meshes with singularities, which occur very frequently in the real-world. Most efficient polygon...
ICS
2010
Tsinghua U.
15 years 2 months ago
2010
Tsinghua U.
: Perhaps the two most significant theoretical questions about the programming of self-assembling agents are: (1) necessary and sufficient conditions to produce a unique terminal a...