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TCAD
2010
14 years 6 months ago
2010
Artificial neural networks (ANNs) have shown great promise in modeling circuit parameters for computer aided design applications. Leakage currents, which depend on process paramete...
TCAD
2010
14 years 6 months ago
2010
Starting from the 90nm technology node, process induced stress has played a key role in the design of highperformance devices. The emergence of source/drain silicon germanium (S/D ...
144
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TCAD
2010
14 years 6 months ago
2010
Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
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TCAD
2010
14 years 6 months ago
2010
Abstract--This paper presents a GALS-compatible circuitswitched on-chip network that is well suited for use in many-core platforms targeting streaming DSP and embedded applications...
131
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TCAD
2010
14 years 6 months ago
2010
Design debugging is a major bottleneck in modern VLSI design flows as both the design size and the length of the error trace contribute to its inherent complexity. With typical des...