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ICIP
2010
IEEE
15 years 3 months ago
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography
Optical lithography is a critical step in the semiconductor manufacturing process, and one key problem is the design of the photomask for a particular circuit pattern, given the o...
Ningning Jia, Edmund Y. Lam
NOMS
2010
IEEE
228views Communications» more  NOMS 2010»
15 years 3 months ago
DA VINCI: A tool to improve VoIP call routing configurations
As IP telephony becomes a critical part of the enterprise network infrastructure, there is an increasing need for tools to help manage VoIP systems. In this paper, we introduce DA ...
Kunwadee Sripanidkulchai, Shu Tao, Zon-Yin Shae
CAI
2010
Springer
15 years 2 months ago
SMA - The Smyle Modeling Approach
Abstract. This paper introduces the model-based software development lifecycle model SMA--the Smyle Modeling Approach--which is centered around Smyle. Smyle is a dedicated learning...
Benedikt Bollig, Joost-Pieter Katoen, Carsten Kern...
CHI
2011
ACM
14 years 8 months ago
MemTable: an integrated system for capture and recall of shared histories in group workspaces
This paper presents the design, implementation, and evaluation of an interactive tabletop system that supports co-located meeting capture and asynchronous search and review of pas...
Seth E. Hunter, Pattie Maes, Stacey D. Scott, Henr...
ICS
2011
Tsinghua U.
14 years 8 months ago
Page placement in hybrid memory systems
Phase-Change Memory (PCM) technology has received substantial attention recently. Because PCM is byte-addressable and exhibits access times in the nanosecond range, it can be used...
Luiz E. Ramos, Eugene Gorbatov, Ricardo Bianchini