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115
Voted
ISPD
2010
ACM
15 years 7 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
75
Voted
ROMAN
2007
IEEE
15 years 7 months ago
2007
IEEE
— Autism covers a large spectrum of disorders that affect the individual’s way of interacting socially and is often revealed by the individual’s lack of interest in gazing at...
106
Voted
ACCV
2007
Springer
15 years 7 months ago
2007
Springer
Abstract. Many real objects, such as faces, sculptures, or low-reliefs are composed of many detailed parts that can not be easily modeled by an artist nor by 3D scanning. In this p...
127
click to vote
FGR
2006
IEEE
15 years 6 months ago
2006
IEEE
Traditionally, human facial expressions have been studied using either 2D static images or 2D video sequences. The 2D-based analysis is incapable of handing large pose variations....
SBACPAD
2005
IEEE
15 years 6 months ago
2005
IEEE
Complexity is one of the most important problems facing microarchitects. It is exacerbated by the application of optimizations, by scaling to higher issue widths and, in general, ...