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89
Voted
ICCAD
2009
IEEE
14 years 7 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ASPDAC
2009
ACM
15 years 4 months ago
2009
ACM
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
KDD
1997
ACM
15 years 2 months ago
1997
ACM
Theproblemof efficiently and accurately locating patterns of interest in massivetimeseries data sets is an important and non-trivial problemin a wide variety of applications, incl...
FCT
2001
Springer
15 years 2 months ago
2001
Springer
Many documents such as Web documents or XML files have tree structures. A term tree is an unordered tree pattern consisting of internal variables and tree structures. In order to ...
SDM
2009
SIAM
15 years 7 months ago
2009
SIAM
We introduce FuncICA, a new independent component analysis method for pattern discovery in inherently functional data, such as time series data. FuncICA can be considered an analo...