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ICCAD
2008
IEEE
141views Hardware» more  ICCAD 2008»
15 years 6 months ago
Layout decomposition for double patterning lithography
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
FAW
2009
Springer
177views Algorithms» more  FAW 2009»
15 years 4 months ago
Bounds on the Geometric Mean of Arc Lengths for Bounded-Degree Planar Graphs
Data access time becomes the main bottleneck in applications dealing with large-scale graphs. Cache-oblivious layouts, constructed to minimize the geometric mean of arc lengths of ...
Mohammad Khairul Hasan, Sung-Eui Yoon, Kyung-Yong ...
JGAA
2002
81views more  JGAA 2002»
14 years 9 months ago
Graph Drawing in Motion
Enabling the user of a graph drawing system to preserve the mental map between two different layouts of a graph is a major problem. In this paper we present methods that smoothly ...
Carsten Friedrich, Peter Eades
GD
2009
Springer
15 years 2 months ago
Upward Planarization Layout
Recently, we have presented a new practical method for upward crossing minimization [4], which clearly outperformed existing approaches for drawing hierarchical graphs in that resp...
Markus Chimani, Carsten Gutwenger, Petra Mutzel, H...
DAC
1995
ACM
15 years 1 months ago
Automatic Layout Synthesis of Leaf Cells
––This paper describes algorithms for automatic layout synthesisofleafcellsin1–dandinanew1–1/2–dlayoutstyle,useful for non–dual circuit styles. The graph theory based a...
Sanjay Rekhi, J. Donald Trotter, Daniel H. Linder