In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Data access time becomes the main bottleneck in applications dealing with large-scale graphs. Cache-oblivious layouts, constructed to minimize the geometric mean of arc lengths of ...
Mohammad Khairul Hasan, Sung-Eui Yoon, Kyung-Yong ...
Enabling the user of a graph drawing system to preserve the mental map between two different layouts of a graph is a major problem. In this paper we present methods that smoothly ...
Recently, we have presented a new practical method for upward crossing minimization [4], which clearly outperformed existing approaches for drawing hierarchical graphs in that resp...
Markus Chimani, Carsten Gutwenger, Petra Mutzel, H...
––This paper describes algorithms for automatic layout synthesisofleafcellsin1–dandinanew1–1/2–dlayoutstyle,useful for non–dual circuit styles. The graph theory based a...