In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
Abstract : A novel design methodology for test pattern generation in BIST is presented. Here faults and errors in the generator itself are detected. Two different design methodolog...
Dhiraj K. Pradhan, Chunsheng Liu, Krishnendu Chakr...
The adapter design pattern [1], commonly used for integration and evolution in component-based systems, is originally described by roles. In classbased systems, the conventional re...
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...
Bug patterns are erroneous code idioms or bad coding practices that have been proved fail time and time again. They mainly arise from the misunderstanding of language features, th...