Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Nominal calculi have been shown very effective to formally model a variety of computational phenomena. The models of nominal calculi have often infinite states, thus making model ...
We present a points-to analysis technique suitable for environments with small time and memory budgets, such as just-in-time (JIT) compilers and interactive development environmen...
Manu Sridharan, Denis Gopan, Lexin Shan, Rastislav...
As the bandwidth of CPUs and networks continues to grow, it becomes more attractive, for efficiency reasons, to share such resources among several applications with the minimum le...
In current embedded systems, one of the major concerns is energy conservation. The dynamic voltage-scheduling (DVS) framework, which involves dynamically adjusting the voltage and...
Ruibin Xu, Chenhai Xi, Rami G. Melhem, Daniel Moss...