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» Using Architectural Models at Runtime: Research Challenges
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DAC
2006
ACM
16 years 5 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
AINA
2006
IEEE
15 years 10 months ago
Simulation Architecture for Data Processing Algorithms in Wireless Sensor Networks
Abstract— Wireless sensor networks, by providing an unprecedented way of interacting with the physical environment, have become a hot topic for research over the last few years. ...
Yann-Aël Le Borgne, Mehdi Moussaid, Gianluca ...
DAC
2007
ACM
16 years 5 months ago
Fast Second-Order Statistical Static Timing Analysis Using Parameter Dimension Reduction
The ability to account for the growing impacts of multiple process variations in modern technologies is becoming an integral part of nanometer VLSI design. Under the context of ti...
Zhuo Feng, Peng Li, Yaping Zhan
ML
2010
ACM
155views Machine Learning» more  ML 2010»
15 years 3 months ago
On the infeasibility of modeling polymorphic shellcode - Re-thinking the role of learning in intrusion detection systems
Current trends demonstrate an increasing use of polymorphism by attackers to disguise their exploits. The ability for malicious code to be easily, and automatically, transformed in...
Yingbo Song, Michael E. Locasto, Angelos Stavrou, ...
AHS
2006
IEEE
95views Hardware» more  AHS 2006»
15 years 8 months ago
A Modular Framework for the Evolution of Circuits on Configurable Transistor Array Architectures
This paper gives an overview over the progress that has been made by the Heidelberg FPTA group within the field of analog evolvable hardware. Achievements are the design of a CMOS...
Martin Trefzer, Jörg Langeheine, Karlheinz Me...