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132
Voted
HICSS
2010
IEEE
15 years 10 months ago
2010
IEEE
Numerous recent papers have found important relationships between network structure and risks within networks. These results indicate that network structure can dramatically affec...
112
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ISQED
2010
IEEE
15 years 10 months ago
2010
IEEE
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
117
Voted
ASPLOS
2010
ACM
15 years 10 months ago
2010
ACM
Instruction-grain lifeguards monitor the events of a running application at the level of individual instructions in order to identify and help mitigate application bugs and securi...
116
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ASPLOS
2010
ACM
15 years 10 months ago
2010
ACM
Aggressive technology scaling provides designers with an ever increasing budget of cheaper and faster transistors. Unfortunately, this trend is accompanied by a decline in individ...
117
Voted
ASPLOS
2010
ACM
15 years 10 months ago
2010
ACM
Debugging concurrent programs is difficult. This is primarily because the inherent non-determinism that arises because of scheduler interleavings makes it hard to easily reproduc...