738 search results - page 101 / 148 » Workload-based optimization of integration processes |
65
Voted
CVPR
2007
IEEE
15 years 11 months ago
2007
IEEE
Recent work in matting, hole filling, and compositing allows image elements to be mixed in a new composite image. Previous algorithms for matting foreground elements have assumed ...
DAC
2006
ACM
15 years 10 months ago
2006
ACM
Chips manufactured in 90 nm technology have shown large parametric variations, and a worsening trend is predicted. These parametric variations make circuit optimization difficult ...
ISPD
2010
ACM
15 years 4 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
ICRA
2009
IEEE
15 years 4 months ago
2009
IEEE
— A novel approach is presented which aims at building autonomously visual models of unknown objects, using a humanoid robot. Although good methods have been proposed for the spe...
ICSM
2006
IEEE
15 years 3 months ago
2006
IEEE
The test case execution order affects the time at which the objectives of testing are met. If the objective is fault detection, an inappropriate execution order might reveal most ...