Logic simulation is a critical component of the design tool flow in modern hardware development efforts. It is used widely ? from high-level descriptions down to gate-level ones ?...
Debapriya Chatterjee, Andrew DeOrio, Valeria Berta...
Abstract--To reduce chip-scale topography variation in Chemical Mechanical Polishing (CMP) process, dummy fill is widely used to improve the layout density uniformity. Previous res...
Chunyang Feng, Hai Zhou, Changhao Yan, Jun Tao, Xu...
State elements are increasingly vulnerable to soft errors due to their decreasing size, and the fact that latched errors cannot be completely eliminated by electrical or timing ma...
With aggressive technology scaling, SRAM design has been seriously challenged by the difficulties in analyzing rare failure events. In this paper we propose to create statistical ...
Jian Wang, Soner Yaldiz, Xin Li, Lawrence T. Pileg...
Post-silicon validation has recently drawn designers' attention due to its increasing impacts on the VLSI design cycle and cost. One key feature of the post-silicon validatio...