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105
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DAC
2006
ACM
124
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Computer Architecture
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DAC 2006
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Process variation aware OPC with variational lithography modeling
16 years 3 months ago
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www.cerc.utexas.edu
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
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