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110
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ISPD
2010
ACM
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ISPD 2010
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Density gradient minimization with coupling-constrained dummy fill for CMP control
15 years 9 months ago
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eda.ee.ntu.edu.tw
In the nanometer IC design, dummy fill is often performed to improve layout pattern uniformity and the post-CMP quality. However, filling dummies might greatly increase intercon...
Huang-Yu Chen, Szu-Jui Chou, Yao-Wen Chang
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