Sciweavers
Explore
Publications
Books
Software
Tutorials
Presentations
Lectures Notes
Datasets
Labs
Conferences
Community
Upcoming
Conferences
Top Ranked Papers
Most Viewed Conferences
Conferences by Acronym
Conferences by Subject
Conferences by Year
Tools
PDF Tools
Image Tools
Text Tools
OCR Tools
Symbol and Emoji Tools
On-screen Keyboard
Latex Math Equation to Image
Smart IPA Phonetic Keyboard
Community
Sciweavers
About
Terms of Use
Privacy Policy
Cookies
137
click to vote
ISPD
2010
ACM
249
views
Hardware
»
more
ISPD 2010
»
A matching based decomposer for double patterning lithography
15 years 9 months ago
Download
home.eng.iastate.edu
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
Yue Xu, Chris Chu
claim paper
Read More »