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    ICCAD
    2008
    IEEE
    141views Hardware» more  ICCAD 2008»
    Layout decomposition for double patterning lithography
    15 years 10 months ago
    Layout decomposition for double patterning lithography
    Download  vlsicad.ucsd.edu
    In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
    Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
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