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107
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DFT
2007
IEEE
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VLSI
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DFT 2007
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Estimation of Electromigration-Aggravating Narrow Interconnects Using a Layout Sensitivity Model
15 years 9 months ago
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www.ee.ucla.edu
During semiconductor manufacturing, particles undesirably depose on the surface of the wafer causing “open” and “short” defects to interconnects. In this paper, a third ty...
Rani S. Ghaida, Payman Zarkesh-Ha
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