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126
Voted
ICIP
2008
IEEE
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Image Processing
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ICIP 2008
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Inverse image problem of designing phase shifting masks in optical lithography
16 years 5 months ago
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videoprocessing.ucsd.edu
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in the optical lithography process, generating circu...
Stanley H. Chan, Edmund Y. Lam
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