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104
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ICCAD
2007
IEEE
129
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ICCAD 2007
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A novel intensity based optical proximity correction algorithm with speedup in lithography simulation
15 years 11 months ago
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www.cerc.utexas.edu
Abstract—It is important to reduce the Optical Proximity Correction (OPC) runtime while maintaining a good result quality. In this paper, we obtain a better formula, which theore...
Peng Yu, David Z. Pan
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