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120
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GLVLSI
2009
IEEE
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GLVLSI 2009
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Impact of lithography-friendly circuit layout
15 years 7 months ago
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dropzone.tamu.edu
Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This introduces process variations which cause mismatches between desired and actual waf...
Pratik J. Shah, Jiang Hu
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