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ASPDAC
2007
ACM
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ASPDAC 2007
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A New Methodology for Interconnect Parasitics Extraction Considering Photo-Lithography Effects
15 years 7 months ago
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domino.research.ibm.com
Abstract-- Due to photo-lithography effects and manufacture process variations, the actual features fabricated on the wafer are different from the designed ones. This difference ca...
Ying Zhou, Zhuo Li, Yuxin Tian, Weiping Shi, Frank...
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