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    DAC
    2006
    ACM
    124views Computer Architecture» more  DAC 2006»
    Process variation aware OPC with variational lithography modeling
    16 years 21 days ago
    Process variation aware OPC with variational lithography modeling
    Download  www.cerc.utexas.edu
    Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
    Peng Yu, Sean X. Shi, David Z. Pan
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