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TCAD
2010
106views more  TCAD 2010»
13 years 3 months ago
Modeling the Overshooting Effect for CMOS Inverter Delay Analysis in Nanometer Technologies
—With the scaling of complementary metal–oxide– semiconductor (CMOS) technology into the nanometer regime, the overshooting effect due to the input-to-output coupling capacit...
Zhangcai Huang, Atsushi Kurokawa, Masanori Hashimo...
ASPDAC
2007
ACM
101views Hardware» more  ASPDAC 2007»
13 years 8 months ago
Modeling the Overshooting Effect for CMOS Inverter in Nanometer Technologies
Zhangcai Huang, Hong Yu, Atsushi Kurokawa, Yasuaki...
ISLPED
2009
ACM
127views Hardware» more  ISLPED 2009»
13 years 11 months ago
Nanometer MOSFET effects on the minimum-energy point of 45nm subthreshold logic
In this paper, we observe that minimum energy Emin of subthreshold logic dramatically increases when reaching 45 nm node. We demonstrate by circuit simulation and analytical model...
David Bol, Dina Kamel, Denis Flandre, Jean-Didier ...
ISCAS
1999
IEEE
99views Hardware» more  ISCAS 1999»
13 years 9 months ago
CMOS gate modeling based on equivalent inverter
A method for modeling complex CMOS gates by the reduction of each gate to an effective equivalent inverter is introduced. The conducting and parasitic behavior of parallel and ser...
Alexander Chatzigeorgiou, Spiridon Nikolaidis, Ioa...
DT
2007
57views more  DT 2007»
13 years 4 months ago
Leakage Minimization Technique for Nanoscale CMOS VLSI
This paper proposes a new heuristic approach to determine the input pattern that minimizes leakage currents of nanometer CMOS circuits during sleep mode considering stack and fano...
Kyung Ki Kim, Yong-Bin Kim, Minsu Choi, Nohpill Pa...