5 search results - page 1 / 1 » Subwavelength optical lithography: challenges and impact on ... |
10
Voted
ISPD
1999
ACM
13 years 9 months ago
1999
ACM
We review the implications of subwavelength optical lithography for new tools and ows in the interface between layout design and manufacturability. After discussing the necessity ...
DAC
1999
ACM
14 years 5 months ago
1999
ACM
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...
ICCAD
2003
IEEE
14 years 1 months ago
2003
IEEE
Ultra-deep submicron manufacturability impacts physical design (PD) through complex layout rules and large guardbands for process variability; this creates new requirements for ne...
ASPDAC
2009
ACM
13 years 11 months ago
2009
ACM
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
DAC
2008
ACM
14 years 5 months ago
2008
ACM
The threshold voltage (Vth) of a nanoscale transistor is severely affected by random dopant fluctuations and line-edge roughness. The analysis of these effects usually requires at...