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15

ISPD
2009
ACM

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119views Hardware» more ISPD 2009»

Double patterning layout decomposition for simultaneous conflict and stitch minimization

14 years 1 months ago

Double patterning layout decomposition for simultaneous conflict and stitch minimization

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Kun Yuan, Jae-Seok Yang, David Z. Pan

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Added	19 May 2010
Updated	19 May 2010
Type	Conference
Year	2009
Where	ISPD
Authors	Kun Yuan, Jae-Seok Yang, David Z. Pan

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