Abstract--A model for intrinsic artificial development is introduced in this paper. The proposed model features a novel mechanism where growth emerges, rather than being triggered ...
View materialization is a central issue in logical design of data warehouses since it is one of the most powerful techniques to improve the response to the workload. Most approach...
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Abstract. Inductive inference can be considered as one of the fundamental paradigms of algorithmic learning theory. We survey results recently obtained and show their impact to pot...
An integrated model-based development approach has to capture the relationship between requirements, design, and implementation models. In the requirements engineering phase, the m...