We formulate face alignment as a model-based parameter estimation problem in this paper. First, we work within a framework that combines two separate subspace models to r epresent...
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Abstract-- Automatic recognition of activities using time series data collected from exercise can facilitate development of applications that motivate people to exercise more frequ...
Pekka Siirtola, Perttu Laurinen, Eija Haapalainen,...
In the recent years particle filtering has been the dominant paradigm for tracking facial and body features, recognizing temporal events and reasoning in uncertainty. A major prob...
In this paper we investigate named entity transliteration based on a phonetic scoring method. The phonetic method is computed using phonetic features and carefully designed pseudo...