2635 search results - page 40 / 527 » Algorithms for the Database Layout Problem |
118
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ER
2004
Springer
15 years 7 months ago
2004
Springer
Abstract. Locating specific chunks (records) of information within documents on the web is an interesting and nontrivial problem. If the problem of locating and separating records...
111
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FOCS
1997
IEEE
15 years 6 months ago
1997
IEEE
The problem of maintaining data that arrives continuously over time is increasingly prevalent in databases and digital libraries. Building on a model for sliding-window indices de...
104
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DAC
2000
ACM
15 years 6 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
109
Voted
DAC
2004
ACM
15 years 8 months ago
2004
ACM
As the technology migrates into the deep submicron manufacturing (DSM) era, the critical dimension of the circuits is getting smaller than the lithographic wavelength. The unavoid...
111
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GD
2005
Springer
15 years 8 months ago
2005
Springer
Most graph layout algorithms treat nodes as points. The problem of node overlap removal is to adjust the layout generated by such methods so that nodes of non-zero width and height...