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133
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ICCAD
2008
IEEE
16 years 2 months ago
2008
IEEE
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
134
Voted
CVPR
2010
IEEE
16 years 1 months ago
2010
IEEE
Graph-cuts optimization is prevalent in vision and graphics problems. It is thus of great practical importance to parallelize the graph-cuts optimization using today’s ubiquitou...
143
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CBMS
2009
IEEE
16 years 4 days ago
2009
IEEE
Providing a comprehensive set of relevant information at the point of care is crucial for making correct clinical decisions in a timely manner. Retrieval of scenario specific inf...
172
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CGO
2009
IEEE
16 years 4 days ago
2009
IEEE
—The StreamIt programming model has been proposed to exploit parallelism in streaming applications on general purpose multicore architectures. This model allows programmers to sp...
161
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EDBT
2009
ACM
16 years 4 days ago
2009
ACM
This paper introduces the problem of modeling urban transportation systems in a database where certain aspects of the data are probabilistic in nature. The transportation network ...