1730 search results - page 90 / 346 » Computer Aided Design Modeling for Heterogeneous Objects |
ISPD
2010
ACM
15 years 4 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
CLUSTER
2008
IEEE
15 years 4 months ago
2008
IEEE
—Scientific simulation and modeling often aid in making critical decisions in such diverse fields as city planning, severe weather prediction and influenza modeling. In some o...
ACMDIS
2000
ACM
15 years 2 months ago
2000
ACM
One fundamental challenge for the design of the interactive systems of the future is to invent and design environments and cultures in which humans can express themselves and enga...
102
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VLSI
2010
Springer
14 years 8 months ago
2010
Springer
—In this paper, we introduce a design methodology to implement low-complexity and high-speed digital Finite Impulse Response (FIR) filters. Since FIR filters suffer from a larg...
DAC
2003
ACM
15 years 3 months ago
2003
ACM
Reduction of an extracted netlist is an important pre-processing step for techniques such as model order reduction in the design and analysis of VLSI circuits. This paper describe...