Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
In this paper, we originally propose a multiscale feature extraction method of finger-vein patterns based on curvelets and local interconnection structure neural networks. The cur...
The development of object-oriented software starts from requirements expressed commonly as Use Cases. The requirements are then converted into a conceptual or analysis model. Analy...
For the proper design of energy-efficient error control schemes some insight into channel error patterns is needed. This paper presents bit error and packet loss measurements taken...