Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
An accurate model for pre-placement wire length estimation can be a useful tool during the physical design of integrated circuits. In this paper, an a priori wire length estimatio...
Considered as enablers of seamless application-toapplication integration both within company boundaries and on a global scale, Web Services-based SOAs have traditionally focused o...
The widening gap between CPU and memory speed has made caches an integral feature of modern highperformance processors. The high degree of configurability of cache memory can requ...
Rahman Hassan, Antony Harris, Nigel P. Topham, Ari...
Users commonly rely just on scarce textual annotation when their searches for images are semantic or conceptual based. Rich visual information is often thrown away in basic annota...