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ISVLSI
2002
IEEE
81views VLSI» more  ISVLSI 2002»
15 years 2 months ago
Impact of Technology Scaling in the Clock System Power
The clock distribution and generation circuitry is known to consume more than a quarter of the power budget of existing microprocessors. A previously derived clock energy model is...
David Duarte, Narayanan Vijaykrishnan, Mary Jane I...
TVLSI
2008
197views more  TVLSI 2008»
14 years 9 months ago
Leakage Minimization of SRAM Cells in a Dual-Vt and Dual-Tox Technology
-- Aggressive CMOS scaling results in low threshold voltage and thin oxide thickness for transistors manufactured in deep submicron regime. As a result, reducing the subthreshold a...
Behnam Amelifard, Farzan Fallah, Massoud Pedram
ICCD
2004
IEEE
154views Hardware» more  ICCD 2004»
15 years 6 months ago
Transistor and Pin Reordering for Gate Oxide Leakage Reduction in Dual T{ox} Circuits
Gate oxide tunneling current (Igate) is emerging as a key roadblock for device scaling in nanometer-scale CMOS circuits. A practical means to reduce Igate is to leverage dual Tox ...
Anup Kumar Sultania, Dennis Sylvester, Sachin S. S...
DAC
2004
ACM
15 years 10 months ago
Selective gate-length biasing for cost-effective runtime leakage control
With process scaling, leakage power reduction has become one of the most important design concerns. Multi-threshold techniques have been used to reduce runtime leakage power witho...
Puneet Gupta, Andrew B. Kahng, Puneet Sharma, Denn...
ICCD
2002
IEEE
93views Hardware» more  ICCD 2002»
15 years 6 months ago
Impact of Scaling on the Effectiveness of Dynamic Power Reduction Schemes
Power is considered to be the major limiter to the design of more faster and complex processors in the near future. In order to address this challenge, a combination of process, c...
David Duarte, Narayanan Vijaykrishnan, Mary Jane I...