6153 search results - page 1011 / 1231 » Modeling Cyclic Change |
139
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DAC
2000
ACM
15 years 10 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
170
Voted
SAC
2000
ACM
15 years 10 months ago
2000
ACM
The mobility of terminals and users is a crucial issue in the open global system represented by the Internet. Supporting terminal and user mobility requires a middleware infrastru...
165
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SAC
2000
ACM
15 years 10 months ago
2000
ACM
: The World Wide Web’s anticipated scope as an environment for knowledge exchange has changed dramatically. Without major modifications to its primary mechanisms the Web has turn...
132
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SIGGRAPH
2000
ACM
15 years 10 months ago
2000
ACM
We present new techniques for interactive cinematic lighting design of complex scenes that use procedural shaders. Deep-framebuffers are used to store the geometric and optical in...
157
Voted
CVPR
2010
IEEE
15 years 10 months ago
2010
IEEE
In this paper, we present an appearance-based method for person re-identification. It consists in the extraction of features that model three complementary aspects of the human ap...