—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
In an embedded system, it is common to have several memory areas with different properties, such as access time and size. An access to a specific memory area is usually restricted...
This paper presents a cooperative evolutionary approach for the problem of instance selection for instance based learning. The presented model takes advantage of one of the most r...
In a database system, disclosure of confidential private data may occur if users can put together the answers of past queries. Traditional access control mechanisms cannot guard a...
Gathering and processing sensitive data is a difficult task. In fact, there is no common recipe for building the necessary information systems. In this paper, we present a provably...