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DAC
2000
ACM
15 years 3 months ago
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Ruiqi Tian, D. F. Wong, Robert Boone
HIPEAC
2007
Springer
15 years 5 months ago
Branch History Matching: Branch Predictor Warmup for Sampled Simulation
Computer architects and designers rely heavily on simulation. The downside of simulation is that it is very time-consuming — simulating an industry-standard benchmark on todayâ€...
Simon Kluyskens, Lieven Eeckhout
SBACPAD
2005
IEEE
176views Hardware» more  SBACPAD 2005»
15 years 5 months ago
Analyzing and Improving Clustering Based Sampling for Microprocessor Simulation
The time required to simulate a complete benchmark program using the cycle-accurate model of a microprocessor can be prohibitively high. One of the proposed methodologies, represe...
Yue Luo, Ajay Joshi, Aashish Phansalkar, Lizy Kuri...
JCC
2006
110views more  JCC 2006»
14 years 11 months ago
Using internal and collective variables in Monte Carlo simulations of nucleic acid structures: Chain breakage/closure algorithm
: This article describes a method for solving the geometric closure problem for simplified models of nucleic acid structures by using the constant bond lengths approximation. The r...
Heinz Sklenar, Daniel Wüstner, Remo Rohs
MASCOTS
2003
15 years 28 days ago
Minimizing Packet Loss by Optimizing OSPF Weights Using Online Simulation
In this paper, we present a scheme for minimizing packet loss in OSPF networks by optimizing link weights using Online Simulation. We have chosen packet loss rate in the network a...
Hema Tahilramani Kaur, Tao Ye, Shivkumar Kalyanara...