—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
Computer architects and designers rely heavily on simulation. The downside of simulation is that it is very time-consuming — simulating an industry-standard benchmark on todayâ€...
The time required to simulate a complete benchmark program using the cycle-accurate model of a microprocessor can be prohibitively high. One of the proposed methodologies, represe...
: This article describes a method for solving the geometric closure problem for simplified models of nucleic acid structures by using the constant bond lengths approximation. The r...
In this paper, we present a scheme for minimizing packet loss in OSPF networks by optimizing link weights using Online Simulation. We have chosen packet loss rate in the network a...
Hema Tahilramani Kaur, Tao Ye, Shivkumar Kalyanara...